W. M. Keck Microfabrication Facility
  CSM
MSU PA
MSU
Equipment Resource
 

Resist Processing

Resist Spinner

The first step of a lithography process is to coat a wafer with a thin, uniform layer of resist material (photo resist or electron beam resist depending on the process) using a resist spinner. Several hot plate ovens are available for resist baking. A programmable digital hot plate oven is also available for special baking sequence.